The Properties of Shuffle Screw Dislocation in Semiconductors Silicon and Germanium

نویسندگان

  • Huili Zhang
  • Chun Zhang
  • Chunhua Zeng
  • Lumei Tong
چکیده

The width, Peierls barrier and stress for shuffle screw dislocation in Si and Ge have been calculated by the improved P-N theory. The calculated widths are about 0.6b, b is the Burgers vector. The Peierls barriers for shuffle screw dislocations in Si and Ge are respectively about 3.61~4.61meV/Å and 5.31~13.32meV/Å, Peierls stresses are 1.40~2.07 meV/Å and 1.93~3.29 meV/Å. Our calculated results may correspond to the metastable core of the shuffle screw dislocation which is centred on the bond between two atoms.

برای دانلود رایگان متن کامل این مقاله و بیش از 32 میلیون مقاله دیگر ابتدا ثبت نام کنید

ثبت نام

اگر عضو سایت هستید لطفا وارد حساب کاربری خود شوید

منابع مشابه

The Properties of Shuffle Screw Dislocations in Semiconductors Silicon and Germanium

The dislocation widths, Peierls barriers and Peierls stresses for shuffle screw dislocations in diamond structure crystals, Si and Ge, have been calculated by the improved P-N theory. The widths are about 0.6b, where b is the Burgers vector. The Peierls barrier for shuffle screw dislocation in Si and Ge, is about 3.61~4.61meV/Å and 5.31~13.32meV/Å, respectively. The Peierls stress is about 0.28...

متن کامل

Stability of undissociated screw dislocations in zinc-blende covalent materials from first principle simulations

– The properties of perfect screw dislocations have been investigated for several zinc-blende materials such as diamond, Si, β-SiC, Ge and GaAs, by performing first principles calculations. For almost all elements, a core configuration belonging to shuffle set planes is favored, in agreement with low temperature experiments. Only for diamond, a glide configuration has the lowest defect energy, ...

متن کامل

Investigation of HF/H2O2 Concentration Effect on Structural and Antireflection Properties of Porous Silicon Prepared by Metal-Assisted Chemical Etching Process for Photovoltaic Applications

Porous silicon was successfully prepared using metal-assisted chemical etching method. The Effect of HF/H2O2 concentration in etching solution as an affecting parameter on the prepared porosity type and size was investigated. Field emission electron microscopy (FE-SEM) confirmed that all etched samples had porous structure and the sample which was immersed into HF/H2O2 withmolar ratio of 7/3.53...

متن کامل

Models of core reconstruction for the 90 ◦ partial dislocation in semiconductors

We compare the models that have been proposed in the literature for the atomic structure of the 90 • partial dislocation in the homopolar semiconductors , silicon, diamond, and germanium. In particular, we examine the traditional single-period and our recently proposed double-period core structures. Ab initio and tight-binding results on the core energies are discussed, and the geometries are c...

متن کامل

Characterization of dislocations in germanium layers grown on (011)- and (111)-oriented silicon by coplanar and noncoplanar X-ray diffraction.

Strained germanium grown on silicon with nonstandard surface orientations like (011) or (111) is a promising material for various semiconductor applications, for example complementary metal-oxide semiconductor transistors. However, because of the large mismatch between the lattice constants of silicon and germanium, the growth of such systems is challenged by nucleation and propagation of threa...

متن کامل

ذخیره در منابع من


  با ذخیره ی این منبع در منابع من، دسترسی به آن را برای استفاده های بعدی آسان تر کنید

عنوان ژورنال:

دوره   شماره 

صفحات  -

تاریخ انتشار 2015